Thin films vacuum deposition installation

Purpose : Thin films deposition by laser and magnetron sputtering.

Main technical characteristics:

- Deposited layers thickness from 2 to 1000 nm;

- Laser active body material - Nd: YAG;

- Working laser wave lengths - 532 and 1064 nm;

- Pulse duration – 10-12 ns.

The installation is designed for the thin films deposition by laser and magnetron sputtering. The effect of intense pulsed laser radiation on solid-state materials causes the formation of the erosion plume target material plasma-vapor flow.

Such a flow deposition onto the substrate surface allows to apply the nanosized and thin-film functional layers of various chemical compositions and multilayer structures based on metals, semiconductors, and dielectrics.

It is possible to obtain alloy thin-film layers of a given stoichiometric composition, as well as heating the substrates upto 700 °C.

Installation allows you to solve the following tasks:

- Creation of tribological purpose nanostructured and nanocomposite coatings;

- Creation of catalytic thin-film materials based on transition metal chalcogenides;

- Creation of sensory structures;

- Creation of thin-film materials necessary for a number of applications in nanoelectronics, optics, etc.